Realization of dot DFB lasers

被引:16
作者
Griesinger, UA
Schweizer, H
Kronmuller, S
Geiger, M
Ottenwalder, D
Scholz, F
Pilkuhn, MH
机构
[1] Physikalisches Institut, Universität Stuttgart, 70550 Stuttgart
关键词
D O I
10.1109/68.491547
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Dot lasers with first-, second- and third-order gain coupled distributed feedback (DFB) gratings have been realized by low damage dry etching in combination with wet chemical etching and epitaxial over-growth, This technique allows above room temperature (RT) operation of dot DFB lasers with dot diameters down to 85 nm, The laser spectra show the expected emission of gain coupled DFB lasers, Threshold current densities between 1.1 kA/cm(2) and 2.6 kA/cm(2) could be obtained depending on size of the active region, An improvement in To could be demonstrated comparing 0-D/1-D/2-D lasers on the same wafer, Based on the dot grating geometry improvement of the side mode suppression ratio (SMSR) was observed for broad-area dot DFB lasers.
引用
收藏
页码:587 / 589
页数:3
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