Patterning of a polysiloxane precursor to silicate glasses by microcontact printing

被引：18

作者：

Marzolin, C ^{[1
]}

Terfort, A ^{[1
]}

Tien, J ^{[1
]}

Whitesides, GM ^{[1
]}

机构：

[1] Harvard Univ, Dept Chem, Cambridge, MA 02138 USA

来源：

THIN SOLID FILMS | 1998年 / 315卷 / 1-2期

基金：

美国国家科学基金会;

关键词：

glass photoresist; microcontact printing; polysiloxane;

D O I：

10.1016/S0040-6090(97)00682-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A polysiloxane precursor to silicon dioxide was used to generate silica patterns on a flat surface. The conversion of a thin film of this polymer to silica was done either by photolithography or by printing an organic acid on the film. The former technique allowed the formation of structures with thickness as large as 2 mu m. The latter method could generate patterns with sub-micron resolution and thicknesses smaller than 0.2 mu m. These structures could be used as resists for O-2 reactive ion etching (RIE). (C) 1998 Published by Elsevier Science S.A.

引用

页码：9 / 12

页数：4

共 8 条

[1] USING MICROMACHINING, MOLECULAR SELF-ASSEMBLY, AND WET ETCHING TO FABRICATE 0.1-1-MU-M-SCALE STRUCTURES OF GOLD AND SILICON [J].