Low numerical aperture refractive microlenses in fused silica

被引：11

作者：

Nussbaum, P ^{[1
]}

Herzig, HP ^{[1
]}

机构：

[1] Univ Neuchatel, Inst Microtechnol, CH-2000 Neuchatel, Switzerland

来源：

OPTICAL ENGINEERING | 2001年 / 40卷 / 07期

关键词：

microlenses; microfabrication; microsystems; etching; melting resist;

D O I：

10.1117/1.1385335

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Fused silica microlenses with low numerical apertures (NAs) were fabricated. The original photoresist element was realized by the melting resist technology and was transferred into fused silica by reactive ion etching. Low selectivity etching was applied to realize the low NA microlenses. An etch selectivity between photoresist and fused silica down to 0.1 was achieved by using SF6 and O2 gases. Refractive microlenses with NAs down to 0.018 were obtained.

引用

页码：1412 / 1414

页数：3

共 14 条

[1]

Bhardwaj JK, 1995, P SOC PHOTO-OPT INS, V2639, P224, DOI 10.1117/12.221279

[2] THE MANUFACTURE OF MICROLENSES BY MELTING PHOTORESIST [J].

DALY, D ;

STEVENS, RF ;

HUTLEY, MC ;

DAVIES, N .

MEASUREMENT SCIENCE AND TECHNOLOGY, 1990, 1 (08) :759-766

[3]

Eisner M., 1993, EOS TOP M, V2, P17

[4] FABRICATION OF CONTINUOUS-RELIEF MICRO-OPTICAL ELEMENTS BY DIRECT LASER WRITING IN PHOTORESISTS [J].

GALE, MT ;

ROSSI, M ;

PEDERSEN, J ;

SCHUTZ, H .

OPTICAL ENGINEERING, 1994, 33 (11) :3556-3566

[5]

Herzig H.P., 1997, Micro-optics: Elements, Systems, and Applications

[6] E-beam tandem writes short pitch DOEs and gratings for EU-922 FOTA and other optical microsystems [J].

Kley, EB ;

Parriaux, O .

MICRO-OPTICAL TECHNOLOGIES FOR MEASUREMENT, SENSORS, AND MICROSYSTEMS, 1996, 2783 :146-153

[7] Design, fabrication and testing of microlens arrays for sensors and microsystems [J].

Nussbaum, P ;

Volke, R ;

Herzig, HP ;

Eisner, M ;

Haselbeck, S .

PURE AND APPLIED OPTICS, 1997, 6 (06) :617-636

[8] Potential of dry etching for the fabrication of fused silica micro-optical elements [J].

Nussbaum, P ;

Weible, KJ ;

Rossi, M ;

Herzig, HP .

MICROMACHINE TECHNOLOGY FOR DIFFRACTIVE AND HOLOGRAPHIC OPTICS, 1999, 3879 :63-70

[9]

Pang S., 1997, HDB MICROLITHOGRAPHY, V2, P99

[10] TECHNIQUE FOR MONOLITHIC FABRICATION OF MICROLENS ARRAYS [J].

POPOVIC, ZD ;

SPRAGUE, RA ;

CONNELL, GAN .

APPLIED OPTICS, 1988, 27 (07) :1281-1284

← 1 2 →