Time-resolved gas temperature evolution in pulsed Ar-N2 microwave discharge

被引:13
作者
Britun, Nikolay [1 ]
Godfroid, Thomas [2 ]
Konstantinidis, Stephanos [1 ]
Snyders, Rony [1 ,2 ]
机构
[1] Univ Mons, CIRMAP, Lab Chim Interact Plasma Surface ChIPS, B-7000 Mons, Belgium
[2] Mat Nova Res Ctr, B-7000 Mons, Belgium
关键词
ATOMIC NITROGEN; PLASMA; N-2; COEFFICIENTS; DEPOSITION; FREQUENCY; PRESSURE;
D O I
10.1063/1.3576928
中图分类号
O59 [应用物理学];
学科分类号
摘要
Temporal evolution of the gas temperature (T-g) in a pulsed microwave surfaguide discharge is studied by measuring the N-2 rotational temperature. We found that at high power applied per pulse, gas temperature grows linearly, and saturates after about 150 mu s. This effect is absent at low power values, or at short pulse durations. Observed T-g behavior correlates with time-resolved measurements of the N-2 vibrational temperature, as well as with N emission lines. Consequently, T-g time behavior was related to N atoms production in plasma. Using obtained T-g growth rates, the effective power used for plasma heating is determined. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3576928]
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页数:3
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