The dc characteristics of a silicon-on-insulator metal-semiconductor field effect transistor

被引:4
作者
Chattopadhyay, P
机构
[1] Univ Calcutta, Univ Coll Sci, Dept Elect Sci, Calcutta 700009, W Bengal, India
[2] Indian Inst Sci, Jawaharlal Nehru Ctr Adv Sci Res, Bangalore 560064, Karnataka, India
关键词
D O I
10.1088/0268-1242/13/9/012
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The do characteristics of SOI MESFETs have been investigated considering the energy distribution of interface states, fixed charges in the insulating layer and the effect of back gate bias. It is shown that the depletion layer arising at the insulator-channel interface due to interface states and fixed charges, plays a vital role in fixing the device characteristics. In particular, the role of the above non-idealities on the drain current, pinch-off and threshold voltage of the device has been investigated. It has been found that, when a back gate bias is applied, the depletion layer width at the insulator-channel interface shrinks and the device regains its normal properties overcoming the effects caused by interface states and fixed charges.
引用
收藏
页码:1036 / 1041
页数:6
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