Surface roughening in low-pressure chemical vapor deposition

We examine, using (2+1)-dimensional Monte Carlo simulations, the roughening behavior of a reemission model for chemical vapor deposition. We find that, for pure first-order reemission, the interface roughens logarithmically with time and that the scaling exponents are, for most sets of conditions, close to the exponents of the Edwards-Wilkinson model (alpha =0, beta =0, and z=2). We compare our results to experimental results on chemical vapor deposition.