Development of Accurate On-Wafer, Cryogenic Characterization Techniques

被引:26
作者
Laskar, J. [1 ]
Bautista, J. J. [2 ]
Nishimoto, M. [3 ]
Hamai, M. [3 ]
Lai, R. [3 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[2] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
[3] TRW Elect Syst & Technol Div, Redondo Beach, CA 90278 USA
关键词
D O I
10.1109/22.508659
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Significant advances in the development of high electron mobility field-effect transistors (HEMT's) have resulted in cryogenic, low-noise amplifiers (LNA's) whose noise temperatures are within an order of magnitude of the quantum noise limit (hv/k). Further advances in HEMT technology at cryogenic temperatures may eventually lead to the replacement of maser and superconducting-insulator-superconducting (SIS) front-ends in the 1-100 GHz frequency band. Key to identification of the best HEMT's and optimization of cryogenic LNA's is accurate and repeatable device measurements at cryogenic temperatures. A cryogenic on-wafer noise and scattering parameter measurement system has been developed to provide a systematic investigation of HEMT noise characteristics. In addition, an improved parameter extraction technique has been developed to help understand the relationship between device structure and LNA performance.
引用
收藏
页码:1178 / 1183
页数:7
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