Focused ion beam-nanomachined probes for improved electric force microscopy

被引：19

作者：

Menozzi, C ^{[1
]}

Gazzadi, GC ^{[1
]}

Alessandrini, A ^{[1
]}

Facci, P ^{[1
]}

机构：

[1] INFM, Natl Res Ctr S3, I-41100 Modena, Italy

来源：

ULTRAMICROSCOPY | 2005年 / 104卷 / 3-4期

关键词：

atomic force microscopy; focused ion beam; electric force microscopy; force volume;

D O I：

10.1016/j.ultramic.2005.04.004

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Nanomachining and beam-assisted Pt deposition by a focused ion beam (FIB) was used to modify AFM probes for improved electric force measurements.. Si3N4 cantilevers have been endowed with a nano-electrode at the tip apex to confine the electro-sensitive area at the very tip. This action results in both a marked decrease of the parasitic capacitive effect and in an improved electric force microscopy (EFM) contrast and resolution, with respect to usual, full metal-coated cantilevers. This fabrication approach is suited to the development of innovative electro-sensitive probes, useful in different scanning probe techniques. (c) 2005 Elsevier B.V. All rights reserved.

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收藏

页码：220 / 225

页数：6

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