Selective surface activation of a functional monolayer for the fabrication of nanometer scale thiol patterns and directed self-assembly of gold nanoparticles

被引：78

作者：

Fresco, ZM ^{[1
]}

Fréchet, JMJ ^{[1
]}

机构：

[1] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 127卷 / 23期

关键词：

D O I：

10.1021/ja052738s

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Application of a voltage bias between the tip of an atomic force microscope (AFM) and a silicon substrate causes the localized modification of a specially designed self-assembled monolayer (SAM), transforming a surface-bound thiocarbonate into a surface-bound thiol. The resulting surface-bound thiols are used to direct the patternwise self-assembly of gold nanoparticles (AuNPs). This methodology is applied to deposit individual AuNPs onto a surface with nanometer precision and to produce 10 nm lines of closely spaced AuNPs that are a single nanoparticle in width. Copyright © 2005 American Chemical Society.

引用

页码：8302 / 8303

页数：2

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