Diagnostics of a hexamethyldisiloxane/oxygen deposition plasma

被引：28

作者：

Leu, GF ^{[1
]}

Brockhaus, A ^{[1
]}

Engemann, J ^{[1
]}

机构：

[1] Univ Wuppertal, Forschungzentrum Mikrostrukturtech Fmt, D-42119 Wuppertal, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 174卷

关键词：

hexamethyldisiloxane; Fourier transform infrared spectroscopy; cavity ringdown spectroscopy;

D O I：

10.1016/S0257-8972(03)00330-X

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The study presents diagnostic results from a hexamethyldisiloxane/oxygen/argon deposition plasma. The plasma was excited by microwaves using a slot-antenna device. We mainly used Fourier transform infrared spectroscopy to monitor molecule/radical concentrations. Additionally cavity ringdown spectroscopy was set up to determine absolute atomic silicon densities. The measurements were performed in the downstream region of the reactor. By studying the correlation between radical concentrations in the plasma and different input gas compositions we could identify relevant reaction pathways. It is concluded that oxygen is not only involved in the usual oxidation channels but also in breaking the siloxane bond. Consequently, siloxane polymerization occurs mainly on the surface and not in the plasma volume. Another unexpected feature concerns the indirect production of methane by reactions, which can also be controlled through the oxygen concentration. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：928 / 932

页数：5

共 14 条

[1] Silicon dioxide deposition in a microwave plasma reactor [J].

Benissad, N ;

Boisse-Laporte, C ;

Vallée, C ;

Granier, A ;

Goullet, A .

SURFACE & COATINGS TECHNOLOGY, 1999, 116 :868-873

[2] Improvement of hardness in plasma polymerized hexamethyldisiloxane coatings by silica-like surface modification [J].

Benítez, F ;

Martínez, E ;

Esteve, J .

THIN SOLID FILMS, 2000, 377 (377-378) :109-114

[3] Hexamethyldisiloxane film as the bottom antireflective coating layer for ArF excimer laser lithography [J].

Chen, HL ;

Wang, LA .

APPLIED OPTICS, 1999, 38 (22) :4885-4890

[4] Modelling of microwave plasma sources: potential and applications [J].

Engemann, J ;

Walter, M .

PLASMA PHYSICS AND CONTROLLED FUSION, 1999, 41 :B259-B272

[5]

GRAVER CD, 1982, COBLENTZ SOC DESK BO

[6] HYBRID FILMS FORMED FROM HEXAMETHYLDISILOXANE AND SIO BY PLASMA PROCESS [J].

KASHIWAGI, K ;

YOSHIDA, Y ;

MURAYAMA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (08) :1803-1807

[7] Gas-separating properties of membranes coated by HMDSO plasma polymer [J].

Li, K ;

Meichsner, J .

SURFACE & COATINGS TECHNOLOGY, 1999, 116 :841-847

[8] Oxygen diluted hexamethyldisiloxane plasmas investigated by means of in situ infrared absorption spectroscopy and mass spectrometry [J].

Magni, D ;

Deschenaux, C ;

Hollenstein, C ;

Creatore, A ;

Fayet, P .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (01) :87-94

[9] Determination of the gas-phase Si atom density in radio frequency discharges by means of cavity ring-down spectroscopy [J].

Schwabedissen, A ;

Brockhaus, A ;

Georg, A ;

Engemann, J .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (07) :1116-1121

[10] Synthesis of plasma-polymerized hexamethyldisiloxane (HMDSO) films by microwave discharge [J].

Schwarz, J ;

Schmidt, M ;

Ohl, A .

SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3) :859-864

← 1 2 →