Vertical electrode GaN-based light-emitting diode fabricated by selective wet etching technique

被引:26
作者
Kim, SJ
机构
[1] Photonic Devices Research Laboratory, Itswell Co., Ltd., Ochang Scientific Industrial Complex, Cheongwon-gun, Chungbuk 363-911, Namchon-ri
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 5A期
关键词
InGaN/GaN; LED; vertical electrode; receptor; sapphire; MOCVD;
D O I
10.1143/JJAP.44.2921
中图分类号
O59 [应用物理学];
学科分类号
摘要
In order to improve the device performance and productivity, a sapphire-etched vertical-electrode nitride semiconductor (SEVENS) light-emitting diode (LED) is fabricated by a selective wet-etching technique. The sapphire substrate is removed by chemical wet etching and transferred to a conducting Si substrate with a reflector metal. The SEVENS-LED exhibits excellent device performance. Integral light-output power is approximately 3.5 mW at a 20 mA junction current, which indicates a 6.6% external quantum efficiency (EQE). The light-output power was linearly increased with increasing junction current, and the peak wavelength was saturated even with a higher junction current. The enhanced performance of the SEVENS-LED is attributed to changing the lateral electrode to a vertical electrode and transferring a sapphire substrate to a Si receptor with a reflector metal. The SEVENS-LED technique is anticipated to be useful for improving the performance of GaN-based LEDs for future solid-state general illumination applications.
引用
收藏
页码:2921 / 2924
页数:4
相关论文
共 10 条
[1]   Microcavity effects in GaN epitaxial films and in Ag/GaN/sapphire structures [J].
Billeb, A ;
Grieshaber, W ;
Stocker, D ;
Schubert, EF ;
Karlicek, RF .
APPLIED PHYSICS LETTERS, 1997, 70 (21) :2790-2792
[2]   Improved light-output and electrical performance of InGaN-based, light-emitting diode by microroughening of the p-GaN surface [J].
Huh, C ;
Lee, KS ;
Kang, EJ ;
Park, SJ .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (11) :9383-9385
[3]  
Kim SJ, 2003, J KOREAN PHYS SOC, V42, P276
[4]   AlGaN/GaN HEMTs on SiC with fT of over 120-GHz [J].
Kumar, V ;
Lu, W ;
Schwindt, R ;
Kuliev, A ;
Simin, G ;
Yang, J ;
Khan, MA ;
Adesida, I .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (08) :455-457
[5]   GaN/AlGaN high electron mobility transistors with fτ of 110GHz [J].
Micovic, M ;
Nguven, NX ;
Janke, P ;
Wong, WS ;
Hashimoto, P ;
McCray, LM ;
Nguyen, C .
ELECTRONICS LETTERS, 2000, 36 (04) :358-359
[6]   Amber InGaN-based light-emitting diodes operable at high ambient temperatures [J].
Mukai, T ;
Narimatsu, H ;
Nakamura, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1998, 37 (5A) :L479-L481
[7]   30-PERCENT EXTERNAL QUANTUM EFFICIENCY FROM SURFACE TEXTURED, THIN-FILM LIGHT-EMITTING-DIODES [J].
SCHNITZER, I ;
YABLONOVITCH, E ;
CANEAU, C ;
GMITTER, TJ ;
SCHERER, A .
APPLIED PHYSICS LETTERS, 1993, 63 (16) :2174-2176
[8]   Illumination with solid state lighting technology [J].
Steigerwald, DA ;
Bhat, JC ;
Collins, D ;
Fletcher, RM ;
Holcomb, MO ;
Ludowise, MJ ;
Martin, PS ;
Rudaz, SL .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2002, 8 (02) :310-320
[9]   Vertical InGaN-based blue light emitting diode with plated metal base fabricated using laser lift-off technique [J].
Ueda, T ;
Ishida, M ;
Tamura, S ;
Fujimoto, Y ;
Yuri, M ;
Saito, T ;
Ueda, D .
5TH INTERNATIONAL CONFERENCE ON NITRIDE SEMICONDUCTORS (ICNS-5), PROCEEDINGS, 2003, 0 (07) :2219-2222
[10]   Damage-free separation of GaN thin films from sapphire substrates [J].
Wong, WS ;
Sands, T ;
Cheung, NW .
APPLIED PHYSICS LETTERS, 1998, 72 (05) :599-601