Radiation effects in advanced microelectronics technologies

被引:83
作者
Johnston, AH [1 ]
机构
[1] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
关键词
D O I
10.1109/23.685206
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The pace of device scaling has increased rapidly in recent years. Experimental CMOS devices have been produced with feature sizes below 0.1 mu m, demonstrating that devices with feature sizes between 0.1 and 0.25 mu m will likely be available in mainstream technologies after the year 2000. This paper discusses how the anticipated changes in device dimensions and design are likely to affect their radiation response in space environments. Traditional problems, such as total dose effects, SEU and latchup are discussed, along with new phenomena. The latter include hard errors from heavy ions (microdose and gate-rupture errors), and complex failure modes related to advanced circuit architecture. The main focus of the paper is on commercial devices, which are displacing hardened device technologies in many space applications. However, the impact of device scaling on hardened devices is also discussed.
引用
收藏
页码:1339 / 1354
页数:16
相关论文
共 61 条
[1]   Technology challenges for integration near and below 0.1 mu m [J].
Asai, S ;
Wada, Y .
PROCEEDINGS OF THE IEEE, 1997, 85 (04) :505-520
[2]   GENERALIZED SCALING THEORY AND ITS APPLICATION TO A 1/4 MICROMETER MOSFET DESIGN [J].
BACCARANI, G ;
WORDEMAN, MR ;
DENNARD, RH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (04) :452-462
[3]  
BESSOT D, RADECS93 P, P563
[4]  
BEZZERA F, 1997, DAT WORKSH RADECS97
[5]   Two-dimensional simulation of total dose effects on NMOSFET with lateral parasitic transistor [J].
Brisset, C ;
FerletCavrois, V ;
Flament, O ;
Musseau, O ;
Leray, JL ;
Pelloie, JL ;
Escoffier, R ;
Michez, A ;
Cirba, C ;
Bordure, G .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1996, 43 (06) :2651-2658
[6]   Single particle-induced latchup [J].
Bruguier, G ;
Palau, JM .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1996, 43 (02) :522-532
[7]  
BRYANT A, 1994 IEDM, P671
[8]  
CHAPUIS T, 1990, IEEE T NUCL SCI, V37, P839
[9]   A HIGH-PERFORMANCE 0.25-MU-M CMOS TECHNOLOGY .2. TECHNOLOGY [J].
DAVARI, B ;
CHANG, WH ;
PETRILLO, KE ;
WONG, CY ;
MOY, D ;
TAUR, Y ;
WORDEMAN, MR ;
SUN, JYC ;
HSU, CCH ;
POLCARI, MR .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (04) :967-975
[10]   CMOS SCALING FOR HIGH-PERFORMANCE AND LOW-POWER - THE NEXT 10 YEARS [J].
DAVARI, B ;
DENNARD, RH ;
SHAHIDI, GG .
PROCEEDINGS OF THE IEEE, 1995, 83 (04) :595-606