Diffusion of 44Ti and 63Ni in TiAl single crystal

被引：32

作者：

Ikeda, T ^{[1
]}

Kadowaki, H ^{[1
]}

Nakajima, H ^{[1
]}

机构：

[1] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan

来源：

ACTA MATERIALIA | 2001年 / 49卷 / 17期

关键词：

intermetallic compounds; TiAl; diffusion; Ll(0)-type structure;

D O I：

10.1016/S1359-6454(01)00228-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Tracer diffusion of Ti-44 and Ni-63 in gamma -TiAl has been investigated using single crystal samples by the ion-beam sputter-sectioning technique in the temperature range from 1133 to 1307 K and from 1053 to 1278 K. respectively. The tracer diffusion coefficients have been measured in the directions parallel and perpendicular to [001] axis. The diffusion of Ti-44 in the direction perpendicular to the [001] axis is almost an order of magnitude faster than that parallel to the [001] direction. The cause of the anisotropy of the diffusion coefficient has been discussed in view of the defect structure and the correlation of the jump vectors of successive vacancy jumps. On the other hand, the anisotropy for Ni-63 diffusion is less significant. It is suggested that Ni atoms diffuse more randomly in the two kinds of sublattices. (C) 2001 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.

引用

页码：3475 / 3485

页数：11

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[2]

BAKKER H, 1979, PHILOS MAG A, V40, P525, DOI 10.1080/01418617908234857

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