Temperature dependence of the threshold current in 1.55-μm strain-compensated multiquantum-well distributed-feedback lasers
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Bhattacharya, P
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Univ Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USAUniv Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USA
Bhattacharya, P
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Yuan, Y
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机构:Univ Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USA
Yuan, Y
Brock, T
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机构:Univ Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USA
Brock, T
Caneau, C
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机构:Univ Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USA
Caneau, C
Bhat, R
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机构:Univ Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USA
Bhat, R
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[1] Univ Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USA
The temperature dependent threshold current and spectral output characteristics of InP-based 1.55-mu m distributed-feedback (DFB) ridge lasers made by metal-organic vapor phase epitaxial growth and regrowth, electron-beam lithography and grating formation, and reactive ion etching (RIE) have been characterized. Single-mode operation and T-o as high as 120 K at room temperature and below are measured. The high value of T-o is predominantly attributed to the tunnel injection design incorporated in the active region.