Ferroelastic domain wall dynamics in ferroelectric bilayers

被引:29
作者
Anbusathaiah, V. [1 ]
Jesse, S. [2 ]
Arredondo, M. A. [1 ]
Kartawidjaja, F. C. [3 ]
Ovchinnikov, O. S. [4 ]
Wang, J. [3 ]
Kalinin, S. V. [2 ]
Nagarajan, V. [1 ]
机构
[1] Univ New S Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, Australia
[2] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37922 USA
[3] Natl Univ Singapore, Dept Mat Sci & Engn, Singapore 117576, Singapore
[4] Univ Tennessee, Dept Phys & Astron, Knoxville, TN 37996 USA
关键词
Ferroelectrics; Piezoelectrics; Switching spectroscopy PFM; Band excitation piezoforce spectroscopy; Ferroelastic domains; BEHAVIOR; STRESS;
D O I
10.1016/j.actamat.2010.06.004
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High-performance piezoelectric devices based on ferroelectric materials rely heavily on ferroelastic domain wall switching. Here we present visual evidence for the local mechanisms that underpin domain wall dynamics in ferroelastic nanodomains. State-of-the-art band excitation switching spectroscopy piezoforce microscopy (PFM) reveals distinct origins for the reversible and irreversible components of ferroelastic domain motion. Extrapolating the PFM images to case for uniform fields, we posit that, while reversible switching is essentially a linear motion of the ferroelastic domains, irreversible switching takes place via domain wall twists. Critically, real-time images of in situ domain dynamics under an external bias reveal that the reversible component leads to reduced coercive voltages. Finally, we show that junctions representing three-domain architecture represent facile interfaces for ferroelastic domain switching, and are likely responsible for irreversible processes in the uniform fields. The results presented here thus provide (hitherto missing) fundamental insight into the correlations between the physical mechanisms that govern ferroelastic domain behavior and the observed functional response in domain-engineered thin film ferroelectric devices. (C) 2010 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:5316 / 5325
页数:10
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