VUV photoionization time-of-flight mass spectrometry of flash pyrolysis of silane and disilane

被引：27

作者：

Chambreau, SD

Zhang, JS ^{[1
]}

机构：

[1] Univ Calif Riverside, Dept Chem, Riverside, CA 92521 USA

[2] Univ Calif Riverside, Air Pollut Res Ctr, Riverside, CA 92521 USA

来源：

CHEMICAL PHYSICS LETTERS | 2001年 / 343卷 / 5-6期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/S0009-2614(01)00739-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Flash pyrolysis of silane, SiH4, and disilane, Si2H6, diluted in He or Ar (1%), was carried out at temperatures ranging from similar to 700 to similar to 1500 K. After a short reaction time of similar to 20 mus, the initial products were isolated in a supersonic molecular beam and detected by single vacuum ultra-violet (VUV) photon (lambda = 118 or 121 nm) ionization time-of-flight mass spectrometry (TOFMS). Initial decomposition and reaction products, both free radical intermediates and stable species, were directly observed, which included SiH2 and Si2H4. (C) 2001 Elsevier Science B.V. All rights reserved.

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页码：482 / 488

页数：7

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