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Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates
被引:47
作者:
Jogi, Indrek
[1
]
Pars, Martti
[2
]
Aarik, Jaan
[2
]
Aidla, Aleks
[2
]
Laan, Matti
[1
]
Sundqvist, Jonas
[3
]
Oberbeck, Lars
[3
]
Heitmann, Johannes
[3
]
Kukli, Kaupo
[1
,4
]
机构:
[1] Univ Tartu, Inst Expt Phys & Technol, EE-51010 Tartu, Estonia
[2] Univ Tartu, Inst Phys, EE-51014 Tartu, Estonia
[3] Qimonda Dresden GmbH & Co OHG, D-01099 Dresden, Germany
[4] Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland
关键词:
nanostructures;
titanium oxide;
atomic layer deposition;
crystal structure;
chemical composition;
D O I:
10.1016/j.tsf.2007.09.008
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Conformity and phase structure of atomic layer deposited TiO2 thin films grown on silicon substrates were studied. The films were grown using TiCl4 and Ti(OC2H5)(4) as titanium precursors in the temperature range from 125 to 500 degrees C. In all cases perfect conformal growth was achieved on patterned substrates with elliptical holes of 7.5 mu m depth and aspect ratio of about 1:40. Conformal growth was achieved with process parameters similar to those optimized for the growth on planar wafers. The dominant crystalline phase in the as-grown films was anatase, with some contribution from rutile at relatively higher temperatures. Annealing in the oxygen ambient resulted in (re)crystallization whereas the effect of annealing depended markedly on the precursors used in the deposition process. Compared to films grown from TiCl4, the films grown from Ti(OC2H5)(4) were transformed into rutile in somewhat greater extent, whereas in terns of step coverage the films grown from Ti(OC2H5)(4) remained somewhat inferior compared to the films grown from TiCi(4). (C) 2007 Elsevier B.V. All rights reserved.
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页码:4855 / 4862
页数:8
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