Influence of structure development on atomic layer deposition of TiO2 thin films

被引：93

作者：

Aarik, J

Karlis, J

Mändar, H

Uustare, T

Sammelselg, V

机构：

[1] Univ Tartu, Inst Sci Mat, EE-51010 Tartu, Estonia

[2] Univ Tartu, Inst Phys, EE-51014 Tartu, Estonia

来源：

APPLIED SURFACE SCIENCE | 2001年 / 181卷 / 3-4期

关键词：

atomic layer deposition; titanium dioxide; crystallization; surface morphology; adsorption;

D O I：

10.1016/S0169-4332(01)00430-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Microstructure of titanium dioxide (TiO2) thin films grown in the atomic layer deposition (ALD) process from titanium ethoxide (Ti(OCH2CH3)(4)) and water (H2O) vapor was studied. It was revealed that formation of crystalline (anatase) phase in the films at 200 degreesC and higher substrate temperatures resulted in considerable surface roughening and increase in the growth rate. The effect most markedly contributed to the film growth at 200 degreesC. At this temperature, the average growth rate increased 1.4 times with the increase of film thickness from about 100 to 280 nm. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：339 / 348

页数：10

共 23 条

[1] Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
Aarik, J
Aidla, A
Kiisler, AA
Uustare, T
Sammelselg, V
[J]. THIN SOLID FILMS, 1999, 340 (1-2) : 110 - 116
[2] MORPHOLOGY AND STRUCTURE OF TIO2 THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION
AARIK, J
AIDLA, A
UUSTARE, T
SAMMELSELG, V
[J]. JOURNAL OF CRYSTAL GROWTH, 1995, 148 (03) : 268 - 275
[3] Atomic layer deposition of titanium dioxide from TiCl4 and H2O:: investigation of growth mechanism
Aarik, J
Aidla, A
Mändar, H
Uustare, T
[J]. APPLIED SURFACE SCIENCE, 2001, 172 (1-2) : 148 - 158
[4] Anomalous effect of temperature on atomic layer deposition of titanium dioxide
Aarik, J
Aidla, A
Mändar, H
Sammelselg, V
[J]. JOURNAL OF CRYSTAL GROWTH, 2000, 220 (04) : 531 - 537
[5] Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water
Aarik, J
Aidla, A
Sammelselg, V
Uustare, T
Ritala, M
Leskelä, M
[J]. THIN SOLID FILMS, 2000, 370 (1-2) : 163 - 172
[6] ALESKOVSKII VB, 1990, ACTA POLYTECH SCAND, V195, P155
[7] DEPERO LE, 1996, SENSOR ACTUAT B-CHEM, V35, P381
[8] The electrical field effect on the growth of titanium oxide layers by ML-ALE
Drozd, VE
Kopilov, NN
Aleskovski, VB
[J]. APPLIED SURFACE SCIENCE, 1997, 112 : 258 - 263
[9] Photoelectrocatalytic hydrogen production from water on transparent thin film titania of different crystal structures and quantum efficiency characteristics
Ichikawa, S
Doi, R
[J]. THIN SOLID FILMS, 1997, 292 (1-2) : 130 - 134
[10] *INT CTR DIFFR DAT, 211272 PDF INT CTR D

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