Study of ion desorption induced by carbon core excitation for poly-methylmethacrylate thin film using electron-ion coincidence spectroscopy

被引:18
作者
Ikenaga, E
Isari, K
Kudara, K
Yasui, Y
Sardar, SA
Wada, S
Sekitani, T [1 ]
Tanaka, K
Mase, K
Tanaka, S
机构
[1] Hiroshima Univ, Dept Phys Sci, Higashihiroshima 7398526, Japan
[2] Inst Mat Struct Sci, Tsukuba, Ibaraki 3050801, Japan
[3] Nagoya Univ, Dept Phys, Nagoya, Aichi 4648601, Japan
关键词
D O I
10.1063/1.1335817
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have developed a new electron-ion coincidence apparatus combined with synchrotron radiation in order to examine the various ion desorption mechanisms related to the Auger process induced by core excitation. Photon stimulated ion desorption (PSID) of a poly-methylmethacrylate (PMMA) thin film has been investigated by this apparatus. The PSID of PMMA induced by carbon core excitation has been examined using Auger electron yield, total ion yield, resonant Auger electron, and Auger electron-photoion coincidence (AEPICO) spectra. The spectrum of the total ion yield divided by the Auger electron yield shows that the desorption efficiency is largely increased at the resonant excitation of carbon 1s electron in the O-CH3 side chain to sigma*(O-CH3) orbital. In AEPICO measurement, H+ and CHn+ (n = 1-3) ions are observed at various resonant excitations. The AEPICO signal intensity depends on the Auger electron energy. Particularly, the CH3+ ion desorption in coincidence with Auger electron at 270 eV shows strong enhancement with sigma*(O-CH3) resonant excitation. The results of the resonant Auger spectra and AEPICO yield spectra demonstrate the relation of the ion desorption mechanism to the bonding/antibonding character and localized character of the excited sigma*(O-CH3) orbital and the Auger final state. (C) 2001 American Institute of Physics.
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收藏
页码:2751 / 2759
页数:9
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