Electrical characterization of metal-molecule-silicon junctions

被引:33
作者
Wang, W
Lee, T
Kamdar, M
Reed, MA
Stewart, MP
Hwang, JJ
Tour, JM
机构
[1] Yale Univ, Dept Elect Engn, New Haven, CT 06520 USA
[2] Yale Univ, Dept Appl Phys, New Haven, CT 06520 USA
[3] Yale Univ, Dept Phys, New Haven, CT 06520 USA
[4] Rice Univ, Dept Chem, Houston, TX 77005 USA
[5] Rice Univ, Ctr Nanoscale Sci & Technol, Houston, TX 77005 USA
基金
美国国家航空航天局; 美国国家科学基金会;
关键词
hybrid organic-semiconductor devices; silicon; diazonium; tunneling;
D O I
10.1016/S0749-6036(03)00081-8
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Direct assembly of molecules onto silicon surfaces is of particular interest for potential employment in hybrid organic-semiconductor devices. In this study, aryl diazonium salts are used to assemble covalently bound molecular groups onto a hydride-passivated, oxide-free n-type Si(I 11) surface. The reaction of 4-(trimethylsilylethynyl)benzenediazonium tetrafluoroborate generates a molecular layer of 4-(trimethylsilylethynyl)phenylene (TMS-EP) on the Si surface. The monolayer modifies the electrical properties of the interface and exhibits nonlinear current-voltage characteristics, as compared with the ohmic behavior observed from metal-n(++)-Si(I 11) junctions. Results of current-voltage measurements at variable temperatures (from 300 to 10 K) on samples made with the TMS-EP molecules do not show significant thermally-activated transport, indicating tunneling is the dominant transport mechanism for this device structure. The measured data is compared to a tunneling model. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码:217 / 226
页数:10
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