A quantitative measure of medium-range order in amorphous materials from transmission electron micrographs

被引:31
作者
Dash, RK [1 ]
Voyles, PM
Gibson, JM
Treacy, MMJ
Keblinski, P
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12181 USA
[2] Univ Wisconsin, Div Engn & Mat Sci, Madison, WI 53706 USA
[3] Argonne Natl Lab, Argonne, IL 60439 USA
[4] NEC Res Inst, Princeton, NJ 08540 USA
关键词
D O I
10.1088/0953-8984/15/31/317
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We propose an extension to the technique of fluctuation electron microscopy that quantitatively measures a medium-range order correlation length in amorphous materials. In both simulated images from computer-generated paracrystalline amorphous silicon models and experimental images of amorphous silicon, we find that the spatial autocorrelation function of dark-field transmission electron micrographs of amorphous materials exhibits a simple exponential decay. The decay length measures a nanometre-scale structural correlation length in the sample, although it also depends on the microscope resolution. We also propose a new interpretation of the fluctuation microscopy image variance in terms of fluctuations in local atomic pair distribution functions.
引用
收藏
页码:S2425 / S2435
页数:11
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