Nanosieves with microsystem technology for microfiltration applications

被引：70

作者：

van Rijn, CJM ^{[1
]}

Veldhuis, GJ ^{[1
]}

Kuiper, S ^{[1
]}

机构：

[1] Univ Twente, MESA Res Inst, Dept Elect Engn, NL-7500 AE Enschede, Netherlands

来源：

NANOTECHNOLOGY | 1998年 / 9卷 / 04期

关键词：

D O I：

10.1088/0957-4484/9/4/007

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A nanosieve with a very uniform pore size of 260 nm and a pore-to-pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micromachining technology. The nanosieve filter consists of a 0.1 mu m thick silicon nitride membrane perforated with submicron diameter pores and a macroperforated inorganic silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.

引用

页码：343 / 345

页数：3

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