Ferroelectric Field Effect Transistors for Memory Applications

被引:266
作者
Hoffman, Jason [1 ,2 ]
Pan, Xiao [1 ,2 ]
Reiner, James W. [1 ,2 ]
Walker, Fred J. [1 ,2 ]
Han, J. P. [3 ]
Ahn, Charles H. [1 ,2 ]
Ma, T. P. [1 ,2 ]
机构
[1] Yale Univ, Dept Elect Engn, New Haven, CT 06520 USA
[2] Yale Univ, CRISP, New Haven, CT 06520 USA
[3] Infineon, Technol Joint Dev Ctr, Fishkill, NY 12533 USA
基金
美国国家科学基金会;
关键词
SILICON-NITRIDE; ACCESS MEMORY; THIN-FILMS; SI; RETENTION; BUFFER; CAPACITORS; GROWTH; LAYERS;
D O I
10.1002/adma.200904327
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The non-volatile polarization of a ferroelectric is a promising candidate for digital memory applications. Ferroelectric capacitors have been successfully integrated with silicon electronics, where the polarization state is read out by a device based on a field effect transistor configuration. Coupling the ferroelectric polarization directly to the channel of a field effect transistor is a long-standing research topic that has been difficult to realize due to the properties of the ferroelectric and the nature of the interface between the ferroelectric and the conducting channel. Here, we report on the fabrication and characterization of two promising capacitor-less memory architectures.
引用
收藏
页码:2957 / 2961
页数:5
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