Surface micromachining technology applied to the fabrication of a FET pressure sensor

被引:20
作者
Svensson, L
Plaza, JA
Benitez, MA
Esteve, J
机构
[1] Ctro. Nac. de Microelectronica-CNM, CSIC, Campus UAB
关键词
D O I
10.1088/0960-1317/6/1/018
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a novel surface-micromachined pressure sensor based in a FET device. The diaphragm acts as the gate of the transistor and the gate-source voltage varies in a nearly linear form with pressure when keeping constant the current along the channel. Both theoretical characteristics and the technological process are analysed. Finally the advantages over existing microsensors are examined.
引用
收藏
页码:80 / 83
页数:4
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