Valence electronic excitation of the SiF4 molecule:: generalized oscillator strength for the 5t2→6a1 transition and ab initio calculation

被引:17
作者
de Souza, GGB
Rocco, MLM
Boechat-Roberty, HM
Lucas, CA
Borges, I
Hollauer, E
机构
[1] Fed Univ Rio De Janeiro, Inst Quim, BR-21949900 Rio De Janeiro, Brazil
[2] Fed Univ Rio De Janeiro, Observ Valongo, BR-20080090 Rio De Janeiro, Brazil
[3] Univ Fed Fluminense, Inst Quim, BR-24020150 Niteroi, RJ, Brazil
关键词
D O I
10.1088/0953-4075/34/6/303
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The electronic excitation of the silicon tetrafluoride (SiF4) molecule has been studied using the angle-resolved electron energy-loss technique, at 1.0 keV incident electron energy, in the 0-50 eV energy range with an angular range of 1.5 degrees -20.0 degrees. The absolute generalized oscillator strength (GOS) for the 5t(2) --> 6a(1) electronic transition, located at 13.0 eV, has been determined. A minimum has been observed in the GOS for this transition at K-2 = 1.4 au. We have also determined the absolute elastic and inelastic differential cross sections at I keV. In order to help in the interpretation of the experimental results, ab initio calculations have been performed for the vertical valence transitions and ionization energies for the SiF4 molecule. Configuration-interaction calculations, including single and double excitations (CI-SD) and the symmetry-adapted-cluster expansion (SAC) were used. The CI-SD approach was also employed to obtain the optical oscillator strength for the 5t(2) --> 6a(1) transition.
引用
收藏
页码:1005 / 1017
页数:13
相关论文
共 38 条
[21]   ELECTRON-IMPACT SPECTROSCOPY OF SIF4 AND GEF4 [J].
KUROKI, K ;
SPENCE, D ;
DILLON, MA .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1994, 70 (02) :151-160
[22]   ELECTRONIC-STRUCTURE AND THERMOCHEMISTRY OF SILICON HYDRIDE AND SILICON FLUORIDE ANIONS [J].
MICHELS, HH ;
HOBBS, RH .
CHEMICAL PHYSICS LETTERS, 1993, 207 (4-6) :389-396
[23]   Structure of polycrystalline silicon films deposited at low temperature by plasma CVD on substrates exposed to different plasma [J].
Moniruzzaman, S ;
Inokuma, T ;
Kurata, Y ;
Takenaka, S ;
Hasegawa, S .
THIN SOLID FILMS, 1999, 337 (1-2) :27-31
[24]   UNIVERSAL FORMULA TO EXTRAPOLATE THE GENERALIZED OSCILLATOR STRENGTH THROUGH THE UNPHYSICAL REGION TO K(2)=0 [J].
MSEZANE, AZ ;
SAKMAR, IA .
PHYSICAL REVIEW A, 1994, 49 (04) :2405-2410
[25]   CLUSTER EXPANSION OF THE WAVEFUNCTION - CALCULATION OF ELECTRON CORRELATIONS IN GROUND AND EXCITED-STATES BY SAC AND SAC CI THEORIES [J].
NAKATSUJI, H .
CHEMICAL PHYSICS LETTERS, 1979, 67 (2-3) :334-342
[26]   CLUSTER-EXPANSION OF THE WAVEFUNCTION - ELECTRON CORRELATIONS IN THE GROUND-STATE, VALENCE AND RYDBERG EXCITED-STATES, IONIZED STATES, AND ELECTRON ATTACHED STATES OF FORMALDEHYDE BY SAC AND SAC-CL THEORIES [J].
NAKATSUJI, H ;
OHTA, K ;
HIRAO, K .
JOURNAL OF CHEMICAL PHYSICS, 1981, 75 (06) :2952-2958
[27]   EXCITED AND IONIZED STATES OF RUO4 AND OSO4 STUDIED BY SAC AND SAC-CI THEORIES [J].
NAKATSUJI, H ;
SAITO, S .
INTERNATIONAL JOURNAL OF QUANTUM CHEMISTRY, 1991, 39 (01) :93-113
[28]   THEORETICAL-STUDY FOR THE EXCITED-STATES OF MOO4-NSN(2-)(N=0APPROXIMATELY4) AND MOSE-4(2-) [J].
NAKATSUJI, H ;
SAITO, S .
JOURNAL OF CHEMICAL PHYSICS, 1990, 93 (03) :1865-1875
[29]   EXPONENTIALLY GENERATED WAVE-FUNCTIONS AND EXCITED-STATES OF BENZENE [J].
NAKATSUJI, H .
THEORETICA CHIMICA ACTA, 1987, 71 (2-3) :201-229
[30]   MIXED-EXPONENTIALLY GENERATED WAVE-FUNCTION METHOD FOR GROUND, EXCITED, IONIZED, AND ELECTRON ATTACHED STATES OF A MOLECULE [J].
NAKATSUJI, H .
JOURNAL OF CHEMICAL PHYSICS, 1991, 95 (06) :4296-4305