Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

被引：27

作者：

Ferré-Borrull, J

Duparré, A

Quesnel, E

机构：

[1] Fraunhofer Inst Appl Opt & Precis Engn, D-07745 Jena, Germany

[2] Commissariat Energie Atom, Dept Optron, Lab Elect Technol & Instrumentat, F-38054 Grenoble, France

来源：

APPLIED OPTICS | 2000年 / 39卷 / 31期

关键词：

D O I：

10.1364/AO.39.005854

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Scattering characteristics of multilayer fluoride coatings for 193 nn deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses. (C) 2000 Optical Society of America OCIS codes: 310.6860, 290.5820, 180.5810, 140.7240.

引用

页码：5854 / 5864

页数：11

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