Chemical amplification resists for microlithography

被引：518

作者：

Ito, H ^{[1
]}

机构：

[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

来源：

MICROLITHOGRAPHY - MOLECULAR IMPRINTING | 2005年 / 172卷

关键词：

D O I：

10.1007/b97574

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

This chapter describes polymers employed in formulation of chemically amplified resists for microlithography, which have become the workhorse in device manufacturing for the last few years and are continuing to be imaging materials of choice for a few more generations. The primary focus is placed on chemistries that are responsible for their lithographic imaging. Furthermore, innovations in the polymer design and processing that have supported the evolution of photolithography and advancement of the microelectronics technology are described. The topics covered in this chapter include the history, rapid development in the last 20 years, the current status, and the future perspective of chemical amplification resists.

引用

页码：37 / 245

页数：209

共 643 条

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