Chemical amplification resists for microlithography

被引：518

作者：

Ito, H ^{[1
]}

机构：

[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

来源：

MICROLITHOGRAPHY - MOLECULAR IMPRINTING | 2005年 / 172卷

关键词：

D O I：

10.1007/b97574

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

This chapter describes polymers employed in formulation of chemically amplified resists for microlithography, which have become the workhorse in device manufacturing for the last few years and are continuing to be imaging materials of choice for a few more generations. The primary focus is placed on chemistries that are responsible for their lithographic imaging. Furthermore, innovations in the polymer design and processing that have supported the evolution of photolithography and advancement of the microelectronics technology are described. The topics covered in this chapter include the history, rapid development in the last 20 years, the current status, and the future perspective of chemical amplification resists.

引用

页码：37 / 245

页数：209

共 643 条

[81]

DANUSSO F, 1965, CHIM IND-MILAN, V47, P55

[82] New water-processible chemically amplified resists: Three steps, two tones, one solvent. [J].

Darling, GD ;

Vekselman, AM ;

Yamada, S .

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2, 1998, 3333 :438-446

[83]

DEFOREST W, 1975, PHOTRESIS MAT PROCES

[84] EFFECTS OF PHOTO-ELECTRON AND AUGER-ELECTRON SCATTERING ON RESOLUTION AND LINEWIDTH CONTROL IN SR LITHOGRAPHY [J].

DEGUCHI, K ;

ISHIYAMA, T ;

HORIUCHI, T ;

YOSHIKAWA, A .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1990, 29 (10) :2207-2211

[85] A NEW MECHANISM FOR PHOTODECOMPOSITION AND ACID FORMATION FROM TRIPHENYLSULFONIUM SALTS [J].

DEKTAR, JL ;

HACKER, NP .

JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS, 1987, (20) :1591-1592

[86] PHOTOCHEMISTRY OF TRIARYLSULFONIUM SALTS [J].

DEKTAR, JL ;

HACKER, NP .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1990, 112 (16) :6004-6015

[87] NOVEL PHOTOINDUCED ELECTRON-TRANSFER REACTIONS BETWEEN NAPHTHALENE AND TRIPHENYLSULFONIUM SALTS [J].

DEKTAR, JL ;

HACKER, NP .

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 1989, 46 (02) :233-238

[88] TRIPHENYLSULFONIUM SALT PHOTOCHEMISTRY - NEW EVIDENCE FOR TRIPLET EXCITED-STATE REACTIONS [J].

DEKTAR, JL ;

HACKER, NP .

JOURNAL OF ORGANIC CHEMISTRY, 1988, 53 (08) :1833-1835

[89] Interface and surface effects on the glass transition in thin polystyrene films [J].

DeMaggio, GB ;

Frieze, WE ;

Gidley, DW ;

Zhu, M ;

Hristov, HA ;

Yee, AF .

PHYSICAL REVIEW LETTERS, 1997, 78 (08) :1524-1527

[90] On-wafer photoacid determination and imaging technique for chemically amplified photoresists [J].

Dentinger, PM ;

Lu, B ;

Taylor, JW ;

Bukofsky, SJ ;

Feke, GD ;

Hessman, D ;

Grober, RD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3767-3772

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