Stitching-error reduction in gratings by shot-shifted electron-beam lithography

被引：18

作者：

Dougherty, DJ ^{[1
]}

Muller, RE

Maker, PD

Forouhar, S

机构：

[1] Scion Photon, Milpitas, CA 95035 USA

[2] CALTECH, Jet Prop Lab, Microdevices Lab, Pasadena, CA 91109 USA

来源：

JOURNAL OF LIGHTWAVE TECHNOLOGY | 2001年 / 19卷 / 10期

关键词：

diffraction; electron-beam lithography; gratings; integrated optics; semiconductor lasers;

D O I：

10.1109/50.956140

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Calculations of the grating spatial-frequency spectrum and the filtering properties of multiple-pass electron-beam writing demonstrate a tradeoff between stitching-error suppression and minimum pitch separation. High-resolution measurements of optical-diffraction patterns show a 25-dB reduction in stitching-error side modes.

引用

收藏

页码：1527 / 1531

页数：5

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