共 32 条
Nano-structured nitrogenated carbon films - morphology and field emission
被引:8
作者:
Kurt, R
[1
]
Bonard, JM
[1
]
Karimi, A
[1
]
机构:
[1] Ecole Polytech Fed Lausanne, Dept Phys, CH-1015 Lausanne, Switzerland
关键词:
chemical vapour deposition;
nitrogenated carbon;
nano-structures;
field emission;
D O I:
10.1016/S0925-9635(01)00388-0
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Crystalline nitrogenated carbon (C:N) films have been successfully synthesised by plasma-enhanced hot filament chemical vapour deposition (PE-HF-CVD). Nitrogen gas (N-2) and ammonia (NH3) were used as sources of atomic nitrogen whereas methane (CH4) acted as a carbon precursor. Structure analysis reveals the growth of a new type of ON film characterised by various polymorphs including worm- and foil-like microstructures at the nanometer scale. The effects of bias voltage and filament temperature on the film morphology are investigated in detail. Using pure Si as a substrate results in growth of homogeneous nanostructured films, whereas arrays of nanotubes were deposited on Ni-coated substrates. Field emission in vacuum was observed on C:N films deposited on pure Si above applied fields of 15 V/mum. The onset field could be decreased below 4 V/mum with Ni-coated substrates due to the presence of well-separated nano-tubular structures. (C) 2001 Elsevier Science B.V. All rights reserved.
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页码:1962 / 1967
页数:6
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