Ultra-violet nitride LED fabrication for high-flux white LED

被引:16
作者
Venugopalan, HS [1 ]
DiCarlo, A [1 ]
Gao, X [1 ]
Libon, S [1 ]
Shelton, BS [1 ]
Stefanov, E [1 ]
Zhang, T [1 ]
Eliashevich, I [1 ]
Weaver, SE [1 ]
Hsing, M [1 ]
Kolodin, B [1 ]
Soules, T [1 ]
Florescu, D [1 ]
Guo, S [1 ]
Pophristic, M [1 ]
Peres, B [1 ]
机构
[1] GELcore LLC, Somerset, NJ USA
来源
LIGHT-EMITTING DIODES: RESEARCH, MANUFACTURING, AND APPLICATIONS VII | 2003年 / 4996卷
关键词
UV LED; flip chip; reflecting contact; MOCVD growth; nitride;
D O I
10.1117/12.486359
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The requirements for maximizing the external quantum efficiency of UV nitride LEDs are discussed. It is shown that as the chip wavelength progressively decreases, nitride epi growth on a sapphire substrate becomes advantageous in terms of light extraction. The epilayer requirements for UV LEDs dictate the growth of n-AlGaN, with increasing AL contents, and the growth of UV-transparent p-GaN. It is shown that MOCVD growth in a Emcore D-180 or Ganzilla reactor is ideal for meeting the stringent epilayer requirements. Increasing light extraction efficiency and wall-plug efficiency also requires optimization of the reflecting P-contact. The relative merits of Al- and Ag-based reflecting contacts are discussed. Performance data for UV LEDs on sapphire, for drive currents up to 700 mA is shown. Finally, a practical high power UV-based white lamp is demonstrated.
引用
收藏
页码:195 / 202
页数:8
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