Novel millimeter-wave near-field resistivity microscope

被引:99
作者
Golosovsky, M
Davidov, D
机构
[1] Hebrew University of Jersusalem, Racah Institute of Physics
关键词
D O I
10.1063/1.116685
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate a technique for contactless mapping of resistivity or dielectric constant of surfaces and films with a spatial resolution better than 100 mu m. This technique may be used for the nondestructive testing of semiconducting wafers, conducting polymers, oxide superconductors, and printed circuits. The principle of operation consists of the scanning of a tiny millimeter-wave antenna at a very small height above an inhomogeneous conducting surface and measuring the intensity and phase of the reflected (transmitted) wave. We use a specially designed resonant slit antenna and achieve subwavelength spatial resolution of lambda/50. (C) 1996 American Institute of Physics.
引用
收藏
页码:1579 / 1581
页数:3
相关论文
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