In-situ contacted single-walled carbon nanotubes and contact improvement by electroless deposition

被引：61

作者：

Seidel, R ^{[1
]}

Liebau, M

Duesberg, GS

Kreupl, F

Unger, E

Graham, AP

Hoenlein, W

Pompe, W

机构：

[1] Infineon Technol AG, Corp Res, D-81730 Munich, Germany

[2] Tech Univ Dresden, Inst Werkstoffwissensch, D-01062 Dresden, Germany

来源：

NANO LETTERS | 2003年 / 3卷 / 07期

关键词：

D O I：

10.1021/nl034229z

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

This work presents a simple and versatile approach for the growth of in-situ contacted single-walled carbon nanotubes (SWCNTs) and subsequent improvement of the contacts using a self-aligned process. We investigated the conditions for the thermal CVD growth of SWCNTs and developed a variety of multilayered metal systems for SWCNT growth at temperatures between 650 degreesC and 900 degreesC. The catalytically active layers were either an Fe/Mo bilayer or a Co layer. Further, we report that some of the multilayer systems presented allow lithography free contact improvement by electroless metal deposition.

引用

页码：965 / 968

页数：4

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