Carrier scattering by dislocations in semiconductors

被引:42
作者
Jaszek, R [1 ]
机构
[1] Univ London Imperial Coll Sci Technol & Med, London, England
关键词
D O I
10.1023/A:1011228626077
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reviews what is known about carrier scattering by dislocations in semiconductors, specifically the misfit dislocations formed at the interfaces of strain-relaxed heterostructures. Carrier scattering by these dislocations is the usual explanation for the poor transport characteristics found in such structures. However, awareness of the current state of the field appears to be poor; papers are often found to use inappropriate models or reference work which has since been substantially revised and updated. No doubt this is the result of the sparse and disparate nature of literature (the most recent review is twenty years old). With this in mind, this paper covers a broad range of topics, from the structure of the dislocation core and the associated energy levels, to various models used to describe carrier scattering, and effects due to screening and strain fields. The latest work on dislocation scattering in two-dimensional systems is also discussed. (C) 2001 Kluwer Academic Publishers.
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页码:1 / 9
页数:9
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