Identification and characterization of a novel silicon hydride species on the Si(100) surface

被引:13
作者
Buehler, EJ [1 ]
Boland, JJ [1 ]
机构
[1] Univ N Carolina, Dept Chem, Venable & Kenan Labs, Chapel Hill, NC 27599 USA
基金
美国国家科学基金会;
关键词
hydrogen; low index single crystal surfaces; scanning tunneling microscopy; semiconducting surfaces; silicon;
D O I
10.1016/S0039-6028(99)00205-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this Letter we describe the existence of a novel silicon hydride species on the Si(100) surface. We demonstrate that this species contains hydrogen in a non-monohydride form and that the number of these species is dependent on the surface preparation. Remarkably, these species are still present on the surface under conditions where hydrogen diffusion occurs and even after the monohydride phase begins to decompose. The possible role of these species in the chemistry of hydrogen on the Si(100) surface is discussed. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:L363 / L368
页数:6
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