LiNbO3 thick films grown on sapphire by using a multistep sputtering process

被引:54
作者
Lansiaux, X [1 ]
Dogheche, E
Remiens, D
Guilloux-viry, M
Perrin, A
Ruterana, P
机构
[1] Inst Univ Technol Valenciennes, Dept Mat Integrat Microelect & Microsyst Le Mont, F-59309 Houy Valenciennes, France
[2] Univ Rennes 1, Chim Solide & Inorgan Mol Lab, UMR 6511, F-35042 Rennes, France
[3] Inst Sci Mat & Rayonnement, Lab Etud & Rech Mat, LERMAT, CNRS, F-14050 Caen, France
关键词
D O I
10.1063/1.1378332
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present the results of investigations of lithium niobate (LiNbO3) films grown on (0001) sapphire substrate by radio-frequency magnetron sputtering. With the aim of producing thick films we have developed a multistep process. To assess the structural quality of our films, we performed x-ray diffraction, transmission electron microscopy, and atomic force microscopy of the films. The results revealed that the epitaxial structure is verified on sapphire whatever the film thickness. Based on our studies we concluded that the proposed multistep process leads to a good controlled epitaxy of thick LiNbO3 samples on sapphire. Using the prism coupling technique we have characterized the optical properties of the deposited layers. The ordinary (n(o)) and extraordinary (n(e)) refractive indices are, respectively, 2.289 +/-0.001 and 2.206 +/-0.001 at 632.8 nm, and waveguide losses of 1.2 dB/cm have been demonstrated. In addition, we have qualified the film properties between each growth step and between the substrate to layer interface, directly from the measured optical data. (C) 2001 American Institute of Physics.
引用
收藏
页码:5274 / 5277
页数:4
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