A study of copper films obtained from the nebulized spray pyrolysis of different precursors

被引：5

作者：

Aiyer, HN ^{[1
]}

Parashar, S

Raju, AR

Shivashankar, SA

Rao, CNR

机构：

[1] Indian Inst Sci, CSIR, Ctr Excellence Chem, Bangalore 560012, Karnataka, India

[2] Indian Inst Sci, Mat Res Ctr, Bangalore 560012, Karnataka, India

[3] Jawaharlal Nehru Ctr Adv Sci Res, Chem & Phys Mat Unit, Bangalore 560064, Karnataka, India

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1999年 / 32卷 / 01期

关键词：

D O I：

10.1088/0022-3727/32/1/002

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Metallic copper films have been deposited on Si(100) substrates by nebulized spray pyrolysis of Cu(acac)(2), Cu(hfac)(2) and Cu(dpm)(2). The structure and morphology of the films have been examined by x-ray diffraction and scanning electron microscopy. The films are polycrystalline in nature with a preferred (lll) orientation. Based on the electrical resistivity data, various transport parameters of the film have been estimated. Growth kinetics and the environmental stability of the films from the precursors have been compared. Taking all the factors into account, Cu(dpm)(2) seems to yield the best films of copper metal.

引用

页码：1 / 8

页数：8

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