Characteristics of oriented LaNiO3 thin films fabricated by the sol-gel method

被引:56
作者
Miyake, S [1 ]
Fujihara, S [1 ]
Kimura, T [1 ]
机构
[1] Keio Univ, Fac Sci & Technol, Dept Appl Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
关键词
CeO2; electrical conductivity; films; perovskites; sol-gel processes;
D O I
10.1016/S0955-2219(01)00056-5
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We fabricated LaNiO3 (LNO) thin films on SiO2 glass, (100) SrTiO3 (STO), (100) Si and CeO2-covered (100) Si substrates by the sol-gel method. The deposited films were heat-treated at 700 degreesC with various conditions, duration and atmosphere. Preferentially (100)-oriented, polycrystalline LNO films were obtained on STO and Si. It was also found that orientated films could be formed even On SiO2 glass and CeO2-covered (100) Si substrates by altering the heating process. We investigated a relationship between the resistance and the crystallite size of the LNO films. The sheet resistance of LNO decreased with increasing crystallite size of LNO. The resistivity and sheet resistance of LNO/STO at 300 K were 340 mu Omega (.)cm and 33.8 Omega/square, respectively, and those values of LNO/CeO2/Si at 300 K were 460 mu Omega (.)cm and 28.8 Omega/square. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1525 / 1528
页数:4
相关论文
共 13 条
[1]   MOCVD growth of (100)-oriented CeO2 thin films on hydrogen-terminated Ssi(100) substrates [J].
Ami, T ;
Suzuki, M .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1998, 54 (1-2) :84-91
[2]   EFFECTS OF (100)-TEXTURED LANIO3 ELECTRODE ON CRYSTALLIZATION AND PROPERTIES OF SOL-GEL-DERIVED PB(ZR0.53TI0.47)O-3 THIN-FILMS [J].
CHEN, MS ;
WU, JM ;
WU, TB .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9A) :4870-4875
[3]   Low-temperature preparation and characterization of SrBi2Ta2O9 thin films on (100)-oriented LaNiO3 electrodes [J].
Hu, GD ;
Wilson, IH ;
Xu, JB ;
Li, CP ;
Wong, SP .
APPLIED PHYSICS LETTERS, 2000, 76 (13) :1758-1760
[4]  
Kern R., 1979, Current Topics in Materials Science, V3, P130
[5]   LaNiO3 under-electrode layers for the growth of textured (Pb0.4Zr0.6)TiO3 thin films using pulsed laser deposition [J].
Kim, SS ;
Kim, BI ;
Park, YB ;
Je, JH .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (Suppl 1) :S625-S628
[6]   Crystallization kinetics of sputter-deposited LaNiO3 thin films on Si substrate [J].
Lee, HY ;
Wu, TB .
JOURNAL OF MATERIALS RESEARCH, 1998, 13 (08) :2291-2296
[7]  
MASHITA M, 1998, KODANSHA, P188
[8]   LOW-TEMPERATURE ELECTRONIC-PROPERTIES OF A NORMAL CONDUCTING PEROVSKITE OXIDE (LANIO3) [J].
RAJEEV, KP ;
SHIVASHANKAR, GV ;
RAYCHAUDHURI, AK .
SOLID STATE COMMUNICATIONS, 1991, 79 (07) :591-595
[9]   Structural and electrical characteristics of Ba(Zr0.12 Ti0.88)O3 thin films deposited on LaNiO3 electrode by RF magnetron sputtering [J].
Shy, HJ ;
Wu, TB .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (10) :5638-5644
[10]   Effects of bottom electrode on the structural and electrical characteristics of barium titanate thin films [J].
Shy, HJ ;
Wu, TB .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (07) :4049-4055