LaNiO3 under-electrode layers for the growth of textured (Pb0.4Zr0.6)TiO3 thin films using pulsed laser deposition

被引：7

作者：

Kim, SS ^{[1
]}

Kim, BI

Park, YB

Je, JH

机构：

[1] Sunchon Natl Univ, Dept Mat Sci & Met Engn, Sunchon 540742, South Korea

[2] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1999年 / 69卷 / Suppl 1期

关键词：

D O I：

10.1007/s003390051491

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We investigated the structural properties of LaNiO3 thin films of three different thicknesses deposited by pulsed laser deposition on Si(001) mainly by using a synchrotron X-ray scattering measurement. The LaNiO3 thin films were grown with the (00l) preferred growth direction, showing completely random distribution in the in-plane direction. In the early stage of the growth, the film was almost unstrained. However, as the film grew further, tensile strain was markedly involved. Also its surface became rougher but its crystalline quality improved significantly with increasing film thickness. A completely (00l)-oriented (Pb0.4Zr0.6)TiO3 thin film was successfully grown on such a LaNiO3/Si(001) substrate at a substrate temperature of 350 degrees C by using the same pulsed laser deposition. Our results show that the LaNiO3 film can serve effectively as a bottom electrode layer for the preparation of a well-oriented (Pb0.4Zr0.6)TiO3 thin film on Si substrates.

引用

页码：S625 / S628

页数：4

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