Effect of photoelectrochemical oxidation on properties of GaN epilayers grown by molecular beam epitaxy

被引:15
作者
Fu, DJ
Kang, TW [1 ]
Yuldashev, SU
Kim, NH
Park, SH
Yun, JS
Chung, KS
机构
[1] Dongguk Univ, Quantum Funct Semicond Res Ctr, Seoul 100715, South Korea
[2] Kyunghee Univ, Dept Elect Engn, Yongin Kun 499701, Kyungki Do, South Korea
[3] Wuhan Univ, Dept Phys, Wuhan 430072, Peoples R China
关键词
D O I
10.1063/1.1351516
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaN epilayers grown by molecular beam epitaxy were photoelectrochemically (PEC) oxidized in an aqueous KOH solution. The oxidation effect was investigated by defect-related photoconductivity and photoluminescence. The PEC treated GaN show decreased extrinsic photoresponse and concentration of deep level states in comparison with the as-grown sample. The PEC process also results in enhanced donor-bound exciton photoluminescence at 3.47 eV and restrained 3.4 eV band. No strain is detected in the PEC oxidized GaN. The 3.4 eV band is related to structural defects instead of oxygen impurities. Rather, the defects can be passivated by the PEC oxidation. (C) 2001 American Institute of Physics.
引用
收藏
页码:1309 / 1311
页数:3
相关论文
共 19 条
  • [1] BELL A, 2000, SEMICOND SCI TECH, V15, P1
  • [2] Effects of interfacial oxides on Schottky barrier contacts to n- and p-type GaN
    Cao, XA
    Pearton, SJ
    Dang, G
    Zhang, AP
    Ren, F
    Van Hove, JM
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (26) : 4130 - 4132
  • [3] THE INFLUENCE OF OXYGEN ON THE ELECTRICAL AND OPTICAL-PROPERTIES OF GAN CRYSTALS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY
    CHUNG, BC
    GERSHENZON, M
    [J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (02) : 651 - 659
  • [4] On the nature of the 3.41 eV luminescence in hexagonal GaN
    Fischer, S
    Steude, G
    Hofmann, DM
    Kurth, F
    Anders, F
    Topf, M
    Meyer, BK
    Bertram, F
    Schmidt, M
    Christen, J
    Eckey, L
    Holst, J
    Hoffmann, A
    Mensching, B
    Rauschenbach, B
    [J]. JOURNAL OF CRYSTAL GROWTH, 1998, 189 : 556 - 560
  • [5] High-temperature processing of GaN: The influence of the annealing ambient on strain in GaN
    Hayes, JM
    Kuball, M
    Bell, A
    Harrison, I
    Korakakis, D
    Foxon, CT
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (14) : 2097 - 2099
  • [6] Effective sulfur passivation of an n-type GaN surface by an alcohol-based sulfide solution
    Huh, C
    Kim, SW
    Kim, HS
    Lee, IH
    Park, SJ
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (09) : 4591 - 4593
  • [7] Deep levels in GaN epilayers grown on sapphire substrates
    Kang, TW
    Yuldashev, SU
    Park, CS
    Chi, CS
    Park, SH
    Ryu, YS
    Kim, TW
    [J]. SOLID STATE COMMUNICATIONS, 1999, 112 (11) : 637 - 642
  • [8] PHOTOELECTROCHEMICAL ETCHING OF HIGH ASPECT RATIO SUBMILLIMETER WAVE-GUIDE FILTERS FROM N+ GAAS WAFERS
    KHARE, R
    HU, EL
    REYNOLDS, D
    ALLEN, SJ
    [J]. APPLIED PHYSICS LETTERS, 1992, 61 (24) : 2890 - 2892
  • [9] Thermal stability of GaN investigated by Raman scattering
    Kuball, M
    Demangeot, F
    Frandon, J
    Renucci, MA
    Massies, J
    Grandjean, N
    Aulombard, RL
    Briot, O
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (07) : 960 - 962
  • [10] Passivation of GaAs using (Ga2O3)1-x(Gd2O3)x, 0≤x≤1.0 films
    Kwo, J
    Murphy, DW
    Hong, M
    Opila, RL
    Mannaerts, JP
    Sergent, AM
    Masaitis, RL
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (08) : 1116 - 1118