Synthesis and characterisation of new hard polyurethanes with triazene pendants

被引:30
作者
Buruiana, EC [1 ]
Melinte, V
Buruiana, T
Lippert, T
Yoshikawa, H
Mashuhara, H
机构
[1] Petru Poni Inst Macromol Chem, Iasi 700487, Romania
[2] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
[3] Osaka Univ, Dept Appl Phys, Suita, Osaka 5650871, Japan
关键词
hard triazene polyurethanes; photosensitivity; UV irradiation; laser ablation;
D O I
10.1016/j.jphotochem.2004.11.001
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Three new hard type polyurethanes based on 2,4-toluene diisocyanate (2,4-TDI) and different triazene diols, namely 1-phenyl-3,3'-di(2hydroxyethyl) triazene (PT-D), 1-naphthyl-3,3'-di(2-hydroxyethyl) triazene (NT-D) and 1-(4-nitro)-phenyl-3,3'-di(2-hydroxyethyl) triazene (NOT-D) were synthesized and characterized. The photosensitivity of these polymers was evaluated by UV irradiation, in DMF solution and as films by following the disappearance of the pi-,pi* absorption band corresponding to the triazene group. The polyurethane containing the NOT-D monomer revealed no decrease of its absorption bands even during prolonged irradiation, but could be structured with high quality using 308 nm laser irradiation. The ablation results revealed that the etching depth could be controlled by varying the laser fluence and number of laser pulses. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:261 / 267
页数:7
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