Very fast light-induced degradation of a-Si:H/c-Si(100) interfaces

被引:70
作者
De Wolf, Stefaan [1 ]
Demaurex, Benedicte [1 ]
Descoeudres, Antoine [1 ]
Ballif, Christophe [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Inst Microengn IMT, Photovolta & Thin Film Elect Lab, CH-2000 Neuchatel, Switzerland
关键词
SURFACE-RECOMBINATION; AMORPHOUS-SILICON; METASTABLE DEFECTS; HYDROGEN; CREATION; VOLTAGE;
D O I
10.1103/PhysRevB.83.233301
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Light-induced degradation (LID) of crystalline silicon (c-Si) surfaces passivated with hydrogenated amorphous silicon (a-Si:H) is investigated. The initial passivation decays on polished c-Si(100) surfaces on a time scale much faster than usually associated with bulk a-Si:H LID. This phenomenon is absent for the a-Si:H/c-Si(111) interface. We attribute these differences to the allowed reconstructions on the respective surfaces. This may point to a link between the presence of so-called "fast" states and (internal) surface reconstruction in bulk a-Si:H.
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页数:4
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