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InGaAsNSb/GaAs quantum wells for 1.55 μm lasers grown by molecular-beam epitaxy
被引:101
作者:
Yang, X
[1
]
Héroux, JB
[1
]
Mei, LF
[1
]
Wang, WI
[1
]
机构:
[1] Columbia Univ, New York, NY 10027 USA
关键词:
D O I:
10.1063/1.1379787
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
InGaAsNSb/GaAs quantum wells (QWs) were grown by solid-source molecular-beam epitaxy using a N-2 radio frequency plasma source. The effect of adding Sb during growth of InGaAsN/GaAs QWs was studied. X-ray diffraction, reflection high-energy electron diffraction and transmission electron microscopy studies indicate that Sb suppresses the three-dimensional growth and improves the interface of the QWs. X-ray diffraction and secondary ion mass spectroscopy analysis show that Sb gets incorporated into the quantum well, which becomes a quinternary compound that was previously unexplored. The introduction of Sb during growth of InGaAsN/GaAs QWs significantly enhances the optical properties of the QWs. 1.53 mum room-temperature photoluminescence was obtained from InGaAsNSb/GaAs QWs, which demonstrates the potential of fabricating 1.55 mum InGaAsNSb/GaAs QW lasers for long-haul applications. (C) 2001 American Institute of Physics.
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页码:4068 / 4070
页数:3
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