Physical-mechanical and physical-chemical properties of thin nanostructured boride/nitride films

被引：27

作者：

Andrievsk, RA ^{[1
]}

Kalinnikov, GV ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Problems Chem Phys, Dept Inorgan Funct Mat, Chernogolovka 142432, Moscow Region, Russia

来源：

SURFACE & COATINGS TECHNOLOGY | 2001年 / 142卷

关键词：

nanostructured films; borides/nitrides; size effects; film deformation; film oxidation;

D O I：

10.1016/S0257-8972(01)01246-4

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Information on the microhardness determined by Vickers and nanoindentation tests, the elastic and electrical properties as well as the behavior at deformation/fracture and oxidation of TiB2, TiN and AIN films are generalized and discussed. The attention is also focused on the crystallite sizes and size effects. The edge dislocations have been observed inside the film crystallites. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：573 / 578

页数：6

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