Micro-photoluminescence and micro-Raman studies near the amorphous-to-microcrystalline transition in Si:H

被引:9
作者
Das, D [1 ]
机构
[1] Indian Assoc Cultivat Sci, Energy Res Unit, Kolkata 700032, W Bengal, India
关键词
thin films; optical properties; luminescence;
D O I
10.1016/S0038-1098(03)00464-2
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Micro-photoluminescence and micro-Raman studies have been performed in the silicon-hydrogen system, near the onset of microcrystallinity, during the transition from amorphous-like to microcrystalline-like phase. Amorphous-like Si:H films before the onset of microcrystallization, as determined by a micro-Raman probe, exhibit a microcrystalline-like photoluminescence (PL) band, which is a doublet within the 1.0-1.2 eV energy band. These two satellite components exhibit two different natures of energy shifts with variation of either excitation intensity or temperature; however, both attribute to the germinate recombination of carriers. The ultimate line shape is determined by the low-energy component, because of its faster quenching with temperature. Two different characteristic temperatures of exponential band-tail states are obtained, contributing tail widths of 22 and 17 meV at lower and higher temperature regimes, respectively, across 200 K, as calculated in terms of the carrier thermalization model. PL-spectroscopy may offer a new means of diagnostics for Si:H network before the onset of microcrystallinity. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码:453 / 456
页数:4
相关论文
共 17 条
[1]   EFFECT OF GAP STATE DENSITY ON THE PHOTOCONDUCTIVITY AND PHOTO-LUMINESCENCE OF ALPHA-SI-H [J].
ANDERSON, DA ;
MODDEL, G ;
COLLINS, RW ;
PAUL, W .
SOLID STATE COMMUNICATIONS, 1979, 31 (09) :677-681
[2]   PLASMA DEPOSITED MICROCRYSTALLINE AND AMORPHOUS-SILICON - A COMPARATIVE-STUDY OF PHOTO-LUMINESCENCE [J].
BHAT, PK ;
DIPROSE, G ;
SEARLE, TM ;
AUSTIN, IG ;
LECOMBER, PG ;
SPEAR, WE .
PHYSICA B & C, 1983, 117 (MAR) :917-919
[3]   MODEL FOR THE TEMPERATURE-DEPENDENCE OF PHOTO-LUMINESCENCE IN A-SI-H AND RELATED MATERIALS [J].
COLLINS, RW ;
PAUL, W .
PHYSICAL REVIEW B, 1982, 25 (08) :5257-5262
[4]   Quantum confinement effects in nano-silicon thin films [J].
Das, D .
SOLID STATE COMMUNICATIONS, 1998, 108 (12) :983-987
[5]   Micro-Raman and ultraviolet ellipsometry studies on μc-Si:H films prepared by H2 dilution to the Ar-assisted SiH4 plasma in radio frequency glow discharge [J].
Das, D .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (05) :2528-2535
[6]   CONTROL OF HYDROGENATION AND MODULATION OF THE STRUCTURAL NETWORK IN SI-H BY INTERRUPTED GROWTH AND H-PLASMA TREATMENT [J].
DAS, D .
PHYSICAL REVIEW B, 1995, 51 (16) :10729-10736
[7]   Heterogeneity in microcrystalline-transition state:: Origin of Si-nucleation and microcrystallization at higher rf power from Ar-diluted SiH4 plasma [J].
Das, D ;
Jana, M ;
Barua, AK .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (05) :3041-3048
[8]  
Queisser H. J., 1988, Polysilicon Films and Interfaces. Symposium, P53
[9]   BAND-TAIL PHOTOLUMINESCENCE IN POLYCRYSTALLINE SILICON THIN-FILMS [J].
SAVCHOUK, AU ;
OSTAPENKO, S ;
NOWAK, G ;
LAGOWSKI, J ;
JASTRZEBSKI, L .
APPLIED PHYSICS LETTERS, 1995, 67 (01) :82-84
[10]   RECOMBINATION IN ALPHA-SI-H - AUGER EFFECTS AND NON-GEMINATE RECOMBINATION [J].
STREET, RA .
PHYSICAL REVIEW B, 1981, 23 (02) :861-868