Comparative study of the roughness of optical surfaces and thin films by use of x-ray scattering and atomic force microscopy

被引：37

作者：

Asadchikov, VE

Duparré, A

Jakobs, S

Karabekov, AY

Kozhevnikov, IV

Krivonosov, YS

机构：

[1] Russian Acad Sci, Inst Crystallog, Moscow 117333, Russia

[2] Fraunhofer Inst Appl Opt & Precis Engn, D-07745 Jena, Germany

[3] PN Lebedev Phys Inst, Moscow 117924, Russia

来源：

APPLIED OPTICS | 1999年 / 38卷 / 04期

关键词：

D O I：

10.1364/AO.38.000684

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The surface roughness of polished glass substrates and optical thin-film coatings is studied with atomic force microscopy and x-ray scattering. It is demonstrated that both methods permit the determination of power spectral density functions in a wide range of spatial frequencies. The results are in good quantitative agreement. (C) 1999 Optical Society of America OCIS codes: 180.0180, 240.5770, 290.0290, 310.0310, 340.0340.

引用

页码：684 / 691

页数：8

共 18 条

[1] Theory of X-ray scattering by rough surfaces without distorted wave approximation [J].