Trapping of minority carriers in multicrystalline silicon

被引:189
作者
Macdonald, D [1 ]
Cuevas, A [1 ]
机构
[1] Australian Natl Univ, Dept Engn, Canberra, ACT 0200, Australia
关键词
D O I
10.1063/1.123663
中图分类号
O59 [应用物理学];
学科分类号
摘要
Abnormally high effective carrier lifetimes have been observed in multicrystalline silicon wafers using both transient and steady-state photoconductance techniques. A simple model based on the presence of trapping centers explains this phenomenon both qualitatively and quantitatively. By fitting this model to experimental data acquired with a quasi-steady-state photoconductance technique, it is possible to determine the trap density, trap energy, and the ratio between the mean-trapping time and mean-escape time. A correlation between trap density and dislocation density in the material has been found. (C) 1999 American Institute of Physics. [S0003-6951(99)03212-X].
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页码:1710 / 1712
页数:3
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