High density mastering using electron beam

被引:37
作者
Kojima, Y [1 ]
Kitahara, H [1 ]
Kasono, O [1 ]
Katsumura, M [1 ]
Wada, Y [1 ]
机构
[1] Pioneer Elect Corp, Corp Res & Dev Labs, Tsurugashima, Saitama 35002, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 4B期
关键词
DVD; electron beam; high density mastering; beam displacement; read-out jitter; track pitch deviation;
D O I
10.1143/JJAP.37.2137
中图分类号
O59 [应用物理学];
学科分类号
摘要
A mastering system for the next-generation digital versatile disk (DVD) is required to have a higher resolution compared with the conventional mastering systems. We have developed an electron beam mastering machine which features a thermal field emitter and a vacuum sealed air spindle motor. Beam displacement caused by magnetic fluctuation with spindle rotation was about 60 nm(p-p) in both the radial and tangential directions. Considering the servo gain of a read-out system, it has little influence on the read-out signal in terms of tracking errors and jitters. The disk performance was evaluated by recording either the 8/16 modulation signal or a groove on the disk. The electron beam recording showed better jitter values from the disk playback than those from a laser beam recorder The deviation of track pitch was 44 nm(p-p). We also confirmed the high density recording with a capacity reaching 30 GB.
引用
收藏
页码:2137 / 2143
页数:7
相关论文
共 13 条
[1]   PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY [J].
CHANG, THP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1271-1275
[2]   MEBES IV THERMAL-FIELD EMISSION TANDEM OPTICS FOR ELECTRON-BEAM LITHOGRAPHY [J].
GESLEY, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :2949-2954
[3]  
HIGUCHI T, UNPUB MORIS ISOM 97
[4]   HIGH RECORDING DENSITY OPTICAL DISC MASTERING [J].
IIDA, T ;
HIGUCHI, T ;
SASAKI, H ;
OGOSHI, K ;
YOKOZEKI, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (11B) :5447-5448
[5]   LASER-BEAM RECORDING OF VIDEO MASTER DISKS [J].
JACOBS, BAJ .
APPLIED OPTICS, 1978, 17 (13) :2001-2006
[6]  
KEIZER EO, 1978, RCA REV, V39, P60
[7]  
KOEK BE, 1997, JPN J APPL PHYS, V32, P5982
[8]   QUANTITATIVE-ANALYSIS OF RESOLUTION AND STABILITY IN NANOMETER ELECTRON-BEAM LITHOGRAPHY [J].
KRATSCHMER, E ;
RISHTON, SA ;
KERN, DP ;
CHANG, THP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2074-2079
[9]  
MAMIN HJ, 1996, S OPT MEM OPT DAT ST, P217
[10]   ELECTRON-BEAM WRITING SYSTEM AND ITS APPLICATION TO LARGE AND HIGH-DENSITY DIFFRACTIVE OPTIC ELEMENTS [J].
OGATA, S ;
TADA, M ;
YONEDA, M .
APPLIED OPTICS, 1994, 33 (10) :2032-2038