Evolution of non-ionic surfactant-templated silicate films at the air-liquid interface

被引：10

作者：

Fernandez-Martin, Cristina ^{[1
]}

Roser, Stephen J. ^{[1
]}

Edler, Karen J. ^{[1
]}

机构：

[1] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2008年 / 18卷 / 11期

基金：

英国科学技术设施理事会;

关键词：

D O I：

10.1039/b716662a

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Spontaneous growth of non-ionic surfactant-templated thin films at the air-water interface was investigated using three techniques: Brewster angle microscopy (BAM), time-resolved off-specular X-ray reflectivity and grazing incidence X-ray diffraction (GIXD). Experiments were also carried out to study the evolution of micelles in the subphase solution using small-angle neutron scattering ( SANS). Films were prepared in acidic conditions using octaethylene glycol mono-n-hexadecyl ether (C16EO8) as the surfactant and tetramethyloxysilane ( TMOS) as the silica precursor. Three different TMOS-C16EO8 molar ratios (3.5, 7.1 and 10.8) were studied. Variation of the silica-precursor concentration causes a significant effect on the film-formation time, the solution and film-growth mechanisms and the final film structure.

引用

页码：1222 / 1231

页数：10

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