Gate coupling and charge distribution in nanowire field effect transistors

被引:115
作者
Khanal, D. R.
Wu, J. [1 ]
机构
[1] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[2] Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
关键词
D O I
10.1021/nl071330l
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We have modeled the field and space charge distributions in back-gate and top-gate nanowire field effect transistors by solving the three-dimensional Poisson's equation numerically. It is found that the geometry of the gate oxide, the serniconductivity of the nanowire, and the finite length of the device profoundly affect both the total amount and the spatial distribution of induced charges in the nanowire, in stark contrast to the commonly accepted picture where metallic dielectric properties and infinite length are assumed for the nanowire and the specific geometry of the gate oxide is neglected. We provide a comprehensive set of numerical correction factors to the analytical capacitance formulas, as well as to numerical calculations that neglect the serniconductivity and finite length of the nanowire, that are frequently used for quantifying carrier transport in nanowire field effect transistors.
引用
收藏
页码:2778 / 2783
页数:6
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